Plant for multilayer multicomponent nanostructure materials and coatings.

The unit is designed for multi-component, multilayer, nanostructure materials and coatings. The plant has CALT SID technology implemented – Cathodic Arc Low Temperature Separated Ion Deposition – application of coating from separated arc discharge plasma at low temperature.

The plant is equipped with:

• two electric arc plasma sources SPS-1 with separation of plasma flow;
• one direct flow plasma source - evaporator;
• highly efficient vacuum system;
• three channel system of working gas supply;
• planetary product rotation mechanism;
• substrate power source operating in both continuous and pulse modes;
• effective high-frequency protection of products from damage by microarc discharges;
• small-sized high frequency power sources;
• modern microprocessor control system.

Read more about the plant, details about specifications of units and systems of the plant and implemented technologies.