Plasma equipment and technologies of coatings deposition
Our plants are built in a modular fashion a set of generic components and systems for specific tasks and requirements.
The figure shows a simplified scheme of a typical plant.
Simplified principle of plant operation is as follows:
Plasma sources of different types, located on walls of vacuum chamber, the flow of plasma is generated based on ions of plasma sources cathode material and ions of working gas supplied to the chamber. The flow is directed to a substrate or products placed in a vacuum chamber on rotation mechanism. Plasma flow ions are accelerated by the voltage from substrate power supply, attached to rotation mechanism. Plasma ions bombard the substrate surface. Depending on the process parameters, we get:
The plant usually includes the following units and devices:
Read more about application and specifications of plant units and systems.